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1 Ergebnisse
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Heavy atomic-layer doping of B in low-temperature Si epitax..:
Tanno, Hiroki
;
Sakuraba, Masao
;
Tillack, Bernd
.
Applied Surface Science. 254 (2008) 19 - p. 6086-6089 , 2008
Link:
https://doi.org/10.1016/j.apsusc.2008.02.132
RT Journal T1
Heavy atomic-layer doping of B in low-temperature Si epitaxial growth on Si(100) by ultraclean low-pressure chemical vapor deposition
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2008.02.132&Exemplar=1&LAN=DE A1 Tanno, Hiroki A1 Sakuraba, Masao A1 Tillack, Bernd A1 Murota, Junichi PB Elsevier BV YR 2008 SN 0169-4332 JF Applied Surface Science VO 254 IS 19 SP 6086 OP 6089 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2008.02.132 DO https://doi.org/10.1016/j.apsusc.2008.02.132 SF ELIB - SuUB Bremen
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