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Confined selective lateral epitaxial growth of 16-nm thick ..:
Khazaka, Rami
;
Bogumilowicz, Yann
;
Rouchon, Denis
...
Applied Surface Science. 445 (2018) - p. 77-80 , 2018
Link:
https://doi.org/10.1016/j.apsusc.2018.03.104
RT Journal T1
Confined selective lateral epitaxial growth of 16-nm thick Ge nanostructures on SOI substrates: Advantages and challenges
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2018.03.104&Exemplar=1&LAN=DE A1 Khazaka, Rami A1 Bogumilowicz, Yann A1 Rouchon, Denis A1 Boutry, Hervé A1 Chalupa, Zdenek A1 Lapras, Valérie A1 Prévitali, Bernard A1 Chevalier, Nicolas A1 Papon, Anne Marie A1 David, Sylvain A1 Maitrejean, Sylvain PB Elsevier BV YR 2018 SN 0169-4332 JF Applied Surface Science VO 445 SP 77 OP 80 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2018.03.104 DO https://doi.org/10.1016/j.apsusc.2018.03.104 SF ELIB - SuUB Bremen
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