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Atomic layer deposition of Ta-doped SnO2 films with enhance..:
Cho, Cheol Jin
;
Pyeon, Jung Joon
;
Hwang, Cheol Seong
..
Applied Surface Science. 497 (2019) - p. 143804 , 2019
Link:
https://doi.org/10.1016/j.apsusc.2019.143804
RT Journal T1
Atomic layer deposition of Ta-doped SnO2 films with enhanced dopant distribution for thermally stable capacitor electrode applications
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2019.143804&Exemplar=1&LAN=DE A1 Cho, Cheol Jin A1 Pyeon, Jung Joon A1 Hwang, Cheol Seong A1 Kim, Jin-Sang A1 Kim, Seong Keun PB Elsevier BV YR 2019 SN 0169-4332 JF Applied Surface Science VO 497 SP 143804 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2019.143804 DO https://doi.org/10.1016/j.apsusc.2019.143804 SF ELIB - SuUB Bremen
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