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1 Ergebnisse
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Using ammonia for reactive magnetron sputtering, a possible..:
Rassinfosse, Louis
;
Colaux, Julien L.
;
Pilloud, David
...
Applied Surface Science. 502 (2020) - p. 144176 , 2020
Link:
https://doi.org/10.1016/j.apsusc.2019.144176
RT Journal T1
Using ammonia for reactive magnetron sputtering, a possible alternative to HiPIMS?
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2019.144176&Exemplar=1&LAN=DE A1 Rassinfosse, Louis A1 Colaux, Julien L. A1 Pilloud, David A1 Nominé, Alexandre A1 Tumanov, Nikolay A1 Lucas, Stéphane A1 Pireaux, Jean-Jacques A1 Haye, Emile PB Elsevier BV YR 2020 SN 0169-4332 JF Applied Surface Science VO 502 SP 144176 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2019.144176 DO https://doi.org/10.1016/j.apsusc.2019.144176 SF ELIB - SuUB Bremen
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