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Thermal gas-phase etching of titanium nitride (TiN) by thio..:
Sharma, Varun
;
Blomberg, Tom
;
Haukka, Suvi
...
Applied Surface Science. 540 (2021) - p. 148309 , 2021
Link:
https://doi.org/10.1016/j.apsusc.2020.148309
RT Journal T1
Thermal gas-phase etching of titanium nitride (TiN) by thionyl chloride (SOCl2)
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2020.148309&Exemplar=1&LAN=DE A1 Sharma, Varun A1 Blomberg, Tom A1 Haukka, Suvi A1 Cembella, Shaun A1 Givens, Michael E. A1 Tuominen, Marko A1 Odedra, Rajesh A1 Graff, Wes A1 Ritala, Mikko PB Elsevier BV YR 2021 SN 0169-4332 JF Applied Surface Science VO 540 SP 148309 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2020.148309 DO https://doi.org/10.1016/j.apsusc.2020.148309 SF ELIB - SuUB Bremen
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