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1 Ergebnisse
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Anti-reflective porous Ge by open-circuit and lithography-f..:
Zhang, Yi-Yu
;
Shin, Sang-Ho
;
Kang, Hyeok-Joong
...
Applied Surface Science. 546 (2021) - p. 149083 , 2021
Link:
https://doi.org/10.1016/j.apsusc.2021.149083
RT Journal T1
Anti-reflective porous Ge by open-circuit and lithography-free metal-assisted chemical etching
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2021.149083&Exemplar=1&LAN=DE A1 Zhang, Yi-Yu A1 Shin, Sang-Ho A1 Kang, Hyeok-Joong A1 Jeon, Sohee A1 Hwang, Soon Hyoung A1 Zhou, Weidong A1 Jeong, Jun-Ho A1 Li, Xiuling A1 Kim, Munho PB Elsevier BV YR 2021 SN 0169-4332 JF Applied Surface Science VO 546 SP 149083 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2021.149083 DO https://doi.org/10.1016/j.apsusc.2021.149083 SF ELIB - SuUB Bremen
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