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Radical flux control in reactive ion beam etching (RIBE) by..:
Kim, Doo San
;
Jang, Yun Jong
;
Kim, Ye Eun
...
Applied Surface Science. 571 (2022) - p. 151311 , 2022
Link:
https://doi.org/10.1016/j.apsusc.2021.151311
RT Journal T1
Radical flux control in reactive ion beam etching (RIBE) by dual exhaust system
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2021.151311&Exemplar=1&LAN=DE A1 Kim, Doo San A1 Jang, Yun Jong A1 Kim, Ye Eun A1 Gil, Hong Seong A1 Kim, Hee Ju A1 Ji, You Jin A1 Kim, Hyung Yong A1 Kim, In Ho A1 Chae, Myoung Kwan A1 Park, Jong Chul A1 Yeom, Geun Young PB Elsevier BV YR 2022 SN 0169-4332 JF Applied Surface Science VO 571 SP 151311 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2021.151311 DO https://doi.org/10.1016/j.apsusc.2021.151311 SF ELIB - SuUB Bremen
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