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Preparation of wafer-scale highly conformalamorphous hafniu..:
Ansari, Mohd Zahid
;
Janicek, Petr
;
Park, Ye Jin
...
Applied Surface Science. 620 (2023) - p. 156834 , 2023
Link:
https://doi.org/10.1016/j.apsusc.2023.156834
RT Journal T1
Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2023.156834&Exemplar=1&LAN=DE A1 Ansari, Mohd Zahid A1 Janicek, Petr A1 Park, Ye Jin A1 NamGung, Sook A1 Cho, Bo Yeon A1 Nandi, Dip K. A1 Jang, Yujin A1 Bae, Jong-Seong A1 Hong, Tae Eun A1 Cheon, Taehoon A1 Song, Wooseok A1 An, Ki-Seok A1 Kim, Soo-Hyun PB Elsevier BV YR 2023 SN 0169-4332 JF Applied Surface Science VO 620 SP 156834 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2023.156834 DO https://doi.org/10.1016/j.apsusc.2023.156834 SF ELIB - SuUB Bremen
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