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1 Ergebnisse
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Surface reaction during thermal atomic layer etching of alu..:
Kim, Yewon
;
Kim, Okhyeon
;
Cho, Gyejun
...
Applied Surface Science. 641 (2023) - p. 158453 , 2023
Link:
https://doi.org/10.1016/j.apsusc.2023.158453
RT Journal T1
Surface reaction during thermal atomic layer etching of aluminum oxide films using fluorine radicals and trimethylaluminum
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2023.158453&Exemplar=1&LAN=DE A1 Kim, Yewon A1 Kim, Okhyeon A1 Cho, Gyejun A1 Kim, Hye-Lee A1 Kim, Minsu A1 Cho, Byungchul A1 Park, Sangjoon A1 Jung, Jongwan A1 Lee, Won-Jun PB Elsevier BV YR 2023 SN 0169-4332 JF Applied Surface Science VO 641 SP 158453 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2023.158453 DO https://doi.org/10.1016/j.apsusc.2023.158453 SF ELIB - SuUB Bremen
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