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Corrigendum to "Effect of deposition temperature and surfac..:
Roh, Hyeonsu
;
Kim, Hye-Lee
;
Khumaini, Khabib
...
Applied Surface Science. , 2024
Link:
https://doi.org/10.1016/j.apsusc.2024.159586
RT Journal T1
Corrigendum to "Effect of deposition temperature and surface reactions in atomic layer deposition of silicon oxide using Bis(diethylamino)Silane and ozone". [Appl. Surf. Sci. 571 (2022) 151231]
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2024.159586&Exemplar=1&LAN=DE A1 Roh, Hyeonsu A1 Kim, Hye-Lee A1 Khumaini, Khabib A1 Son, Heeju A1 Shin, Donggeon A1 Lee, Won-Jun PB Elsevier BV YR 2024 SN 0169-4332 JF Applied Surface Science SP 159586 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2024.159586 DO https://doi.org/10.1016/j.apsusc.2024.159586 SF ELIB - SuUB Bremen
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