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Plasma atomic layer etching of ruthenium by oxygen adsorpti..:
Kim, Doo San
;
Kwon, Hae In
;
Jang, Yun Jong
...
Applied Surface Science. 670 (2024) - p. 160570 , 2024
Link:
https://doi.org/10.1016/j.apsusc.2024.160570
RT Journal T1
Plasma atomic layer etching of ruthenium by oxygen adsorption-removal cyclic process
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2024.160570&Exemplar=1&LAN=DE A1 Kim, Doo San A1 Kwon, Hae In A1 Jang, Yun Jong A1 Kim, Gyoung Chan A1 Gil, Hong Seong A1 Kim, Dae Whan A1 Jeong, Byeong Hwa A1 Yeom, Geun Young PB Elsevier BV YR 2024 SN 0169-4332 JF Applied Surface Science VO 670 SP 160570 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2024.160570 DO https://doi.org/10.1016/j.apsusc.2024.160570 SF ELIB - SuUB Bremen
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