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Reactive ion etching of indium gallium zinc oxide (IGZO) an..:
Woo Hong, Jong
;
Woo Tak, Hyun
;
Il Cho, Nam
...
Applied Surface Science. 671 (2024) - p. 160692 , 2024
Link:
https://doi.org/10.1016/j.apsusc.2024.160692
RT Journal T1
Reactive ion etching of indium gallium zinc oxide (IGZO) and chamber cleaning using low global warming potential gas
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.apsusc.2024.160692&Exemplar=1&LAN=DE A1 Woo Hong, Jong A1 Woo Tak, Hyun A1 Il Cho, Nam A1 Joon Eoh, Hyeong A1 Ho Kim, Chan A1 Won Jeong, Jun A1 Lim Kim, Kyung A1 Jin Yoo, Hee A1 Min Cho, Hyun A1 Gwang Jeong, Yu A1 Woon Jung, Da A1 Jong Yeo, Yun A1 Young Yeom, Geun A1 Woo Kim, Dong PB Elsevier BV YR 2024 SN 0169-4332 JF Applied Surface Science VO 671 SP 160692 LK http://dx.doi.org/https://doi.org/10.1016/j.apsusc.2024.160692 DO https://doi.org/10.1016/j.apsusc.2024.160692 SF ELIB - SuUB Bremen
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