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Characterization of Si etching with N-fluoropyridinium salt:
Tsukamoto, Kentaro
;
Uchikoshi, Junichi
;
Otani, Masaki
...
Current Applied Physics. 12 (2012) - p. S29-S32 , 2012
Link:
https://doi.org/10.1016/j.cap.2012.05.005
RT Journal T1
Characterization of Si etching with N-fluoropyridinium salt
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.cap.2012.05.005&Exemplar=1&LAN=DE A1 Tsukamoto, Kentaro A1 Uchikoshi, Junichi A1 Otani, Masaki A1 Hirano, Toshinori A1 Ie, Yutaka A1 Nagai, Takabumi A1 Adachi, Kenji A1 Kawai, Kentaro A1 Arima, Kenta A1 Morita, Mizuho PB Elsevier BV YR 2012 SN 1567-1739 JF Current Applied Physics VO 12 SP S29 OP S32 LK http://dx.doi.org/https://doi.org/10.1016/j.cap.2012.05.005 DO https://doi.org/10.1016/j.cap.2012.05.005 SF ELIB - SuUB Bremen
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