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1 Ergebnisse
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Optimized annealing conditions to enhance stability of pola..:
Kim, Yeriaron
;
Woo, Jiyong
;
Im, Solyee
...
Current Applied Physics. 20 (2020) 12 - p. 1441-1446 , 2020
Link:
https://doi.org/10.1016/j.cap.2020.09.013
RT Journal T1
Optimized annealing conditions to enhance stability of polarization in sputtered HfZrOx layers for non-volatile memory applications
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.cap.2020.09.013&Exemplar=1&LAN=DE A1 Kim, Yeriaron A1 Woo, Jiyong A1 Im, Solyee A1 Lee, Yeseul A1 Kim, Jeong Hun A1 Im, Jong-Pil A1 Suh, Dongwoo A1 Yang, Sang Mo A1 Yoon, Sung-Min A1 Moon, Seung Eon PB Elsevier BV YR 2020 SN 1567-1739 JF Current Applied Physics VO 20 IS 12 SP 1441 OP 1446 LK http://dx.doi.org/https://doi.org/10.1016/j.cap.2020.09.013 DO https://doi.org/10.1016/j.cap.2020.09.013 SF ELIB - SuUB Bremen
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