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Atomic layer deposition of high-k and metal thin films for ..:
Kim, Se Eun
;
Sung, Ju Young
;
Yun, Yewon
...
Current Applied Physics. 64 (2024) - p. 8-15 , 2024
Link:
https://doi.org/10.1016/j.cap.2024.05.011
RT Journal T1
Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.cap.2024.05.011&Exemplar=1&LAN=DE A1 Kim, Se Eun A1 Sung, Ju Young A1 Yun, Yewon A1 Jeon, Byeongjun A1 Moon, Sang Mo A1 Lee, Han Bin A1 Lee, Chae Hyun A1 Jung, Hae Jun A1 Lee, Jae-Ung A1 Lee, Sang Woon PB Elsevier BV YR 2024 SN 1567-1739 JF Current Applied Physics VO 64 SP 8 OP 15 LK http://dx.doi.org/https://doi.org/10.1016/j.cap.2024.05.011 DO https://doi.org/10.1016/j.cap.2024.05.011 SF ELIB - SuUB Bremen
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