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Viable strategy to minimize trap states of patterned oxide ..:
Kim, Do-Kyung
;
Seo, Kyeong-Ho
;
Kwon, Dae-Hyeon
...
Chemical Engineering Journal. 441 (2022) - p. 135833 , 2022
Link:
https://doi.org/10.1016/j.cej.2022.135833
RT Journal T1
Viable strategy to minimize trap states of patterned oxide thin films for both exceptional electrical performance and uniformity in sol–gel processed transistors
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.cej.2022.135833&Exemplar=1&LAN=DE A1 Kim, Do-Kyung A1 Seo, Kyeong-Ho A1 Kwon, Dae-Hyeon A1 Jeon, Sang-Hwa A1 Hwang, Yu-Jin A1 Wang, Ziyuan A1 Park, Jaehoon A1 Lee, Sin-Hyung A1 Jang, Jaewon A1 Man Kang, In A1 Zhang, Xue A1 Bae, Jin-Hyuk PB Elsevier BV YR 2022 SN 1385-8947 JF Chemical Engineering Journal VO 441 SP 135833 LK http://dx.doi.org/https://doi.org/10.1016/j.cej.2022.135833 DO https://doi.org/10.1016/j.cej.2022.135833 SF ELIB - SuUB Bremen
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