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A Route to MoO2 film fabrication via atomic layer depositio..:
Yoon, Ara
;
Yang, Hae Lin
;
Lee, Sanghoon
...
Ceramics International. 50 (2024) 8 - p. 13841-13848 , 2024
Link:
https://doi.org/10.1016/j.ceramint.2024.01.300
RT Journal T1
A Route to MoO2 film fabrication via atomic layer deposition using Mo(IV) precursor and oxygen reactant for DRAM applications
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.ceramint.2024.01.300&Exemplar=1&LAN=DE A1 Yoon, Ara A1 Yang, Hae Lin A1 Lee, Sanghoon A1 Lee, Seunghwan A1 Kim, Beomseok A1 Jung, Changhwa A1 Lim, Hanjin A1 Park, Jin-Seong PB Elsevier BV YR 2024 SN 0272-8842 JF Ceramics International VO 50 IS 8 SP 13841 OP 13848 LK http://dx.doi.org/https://doi.org/10.1016/j.ceramint.2024.01.300 DO https://doi.org/10.1016/j.ceramint.2024.01.300 SF ELIB - SuUB Bremen
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