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1 Ergebnisse
1
Angstrom surface with high material removal rate for quartz..:
Liu, Lu
;
Zhang, Zhenyu
;
Shi, Chunjing
...
Colloids and Surfaces A: Physicochemical and Engineering Aspects. 682 (2024) - p. 132957 , 2024
Link:
https://doi.org/10.1016/j.colsurfa.2023.132957
RT Journal T1
Angstrom surface with high material removal rate for quartz glass induced by silk dissolved novel green chemical mechanical polishing
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.colsurfa.2023.132957&Exemplar=1&LAN=DE A1 Liu, Lu A1 Zhang, Zhenyu A1 Shi, Chunjing A1 Deng, Xingqiao A1 Zhou, Hongxiu A1 Feng, Junyuan A1 Liu, Xiuqing A1 Liu, Xiaoyu A1 Wen, Wei PB Elsevier BV YR 2024 SN 0927-7757 JF Colloids and Surfaces A: Physicochemical and Engineering Aspects VO 682 SP 132957 LK http://dx.doi.org/https://doi.org/10.1016/j.colsurfa.2023.132957 DO https://doi.org/10.1016/j.colsurfa.2023.132957 SF ELIB - SuUB Bremen
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