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1 Ergebnisse
1
Effect of low-temperature annealing on defect causing coppe..:
Vahlman, Henri
;
Haarahiltunen, Antti
;
Kwapil, Wolfram
...
Energy Procedia. 124 (2017) - p. 188-196 , 2017
Link:
https://doi.org/10.1016/j.egypro.2017.09.314
RT Journal T1
Effect of low-temperature annealing on defect causing copper-related light-induced degradation in p-type silicon
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.egypro.2017.09.314&Exemplar=1&LAN=DE A1 Vahlman, Henri A1 Haarahiltunen, Antti A1 Kwapil, Wolfram A1 Schön, Jonas A1 Yli-Koski, Marko A1 Inglese, Alessandro A1 Modanese, Chiara A1 Savin, Hele PB Elsevier BV YR 2017 SN 1876-6102 JF Energy Procedia VO 124 SP 188 OP 196 LK http://dx.doi.org/https://doi.org/10.1016/j.egypro.2017.09.314 DO https://doi.org/10.1016/j.egypro.2017.09.314 SF ELIB - SuUB Bremen
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