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MOCVD deposition of CoAl2O4 films:
Carta, G.
;
Casarin, M.
;
El Habra, N.
...
Electrochimica Acta. 50 (2005) 23 - p. 4592-4599 , 2005
Link:
https://doi.org/10.1016/j.electacta.2004.10.094
RT Journal T1 <Title>MOCVD deposition of CoAl2O4 films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.electacta.2004.10.094&Exemplar=1&LAN=DE A1 Carta, G. A1 Casarin, M. A1 El Habra, N. A1 Natali, M. A1 Rossetto, G. A1 Sada, C. A1 Tondello, E. A1 Zanella, P. PB Elsevier BV YR 2005 SN 0013-4686 JF Electrochimica Acta VO 50 IS 23 SP 4592 OP 4599 LK http://dx.doi.org/https://doi.org/10.1016/j.electacta.2004.10.094 DO https://doi.org/10.1016/j.electacta.2004.10.094 SF ELIB - SuUB Bremen
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