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1 Ergebnisse
1
Solution processed Li-Al2O3/LiNbO3/Li-Al2O3 stacked gate di..:
Pal, Nila
;
Chakraborty, Rajarshi
;
Sharma, Anand
...
Journal of Alloys and Compounds. 960 (2023) - p. 170691 , 2023
Link:
https://doi.org/10.1016/j.jallcom.2023.170691
RT Journal T1
Solution processed Li-Al2O3/LiNbO3/Li-Al2O3 stacked gate dielectric for a non-volatile ferroelectric thin film transistor
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.jallcom.2023.170691&Exemplar=1&LAN=DE A1 Pal, Nila A1 Chakraborty, Rajarshi A1 Sharma, Anand A1 Pandey, Utkarsh A1 Acharya, Vishwas A1 Prajapati, Krishna A1 Gupta, Akanksha A1 Suman, Swati A1 Swaminathan, Parasuraman A1 Singh, Akhilesh Kumar A1 Roy, Pradip Kumar A1 Pal, Bhola Nath PB Elsevier BV YR 2023 SN 0925-8388 JF Journal of Alloys and Compounds VO 960 SP 170691 LK http://dx.doi.org/https://doi.org/10.1016/j.jallcom.2023.170691 DO https://doi.org/10.1016/j.jallcom.2023.170691 SF ELIB - SuUB Bremen
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