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1 Ergebnisse
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Nail salon dust reveals alarmingly high photoinitiator leve..:
Shen, Jie
;
Liu, Jiale
;
Ji, Xiaomeng
...
Journal of Hazardous Materials. 475 (2024) - p. 134913 , 2024
Link:
https://doi.org/10.1016/j.jhazmat.2024.134913
RT Journal T1
Nail salon dust reveals alarmingly high photoinitiator levels: Assessing occupational risks
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.jhazmat.2024.134913&Exemplar=1&LAN=DE A1 Shen, Jie A1 Liu, Jiale A1 Ji, Xiaomeng A1 Liang, Jiefeng A1 Feng, Xiaoxia A1 Liu, Xiaoyun A1 Wang, Yingjun A1 Zhang, Qingzhe A1 Zhang, Qiu A1 Qu, Guangbo A1 Yan, Bing A1 Liu, Runzeng PB Elsevier BV YR 2024 SN 0304-3894 JF Journal of Hazardous Materials VO 475 SP 134913 LK http://dx.doi.org/https://doi.org/10.1016/j.jhazmat.2024.134913 DO https://doi.org/10.1016/j.jhazmat.2024.134913 SF ELIB - SuUB Bremen
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