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PECVD technology deposition of high hardness a-C:H films on..:
Ren, Beibei
;
Su, Yifan
;
Lou, Jia
...
Journal of Manufacturing Processes. 124 (2024) - p. 385-398 , 2024
Link:
https://doi.org/10.1016/j.jmapro.2024.06.037
RT Journal T1 <Title>PECVD technology deposition of high hardness a-C:H films on micro-drill surfaces: Substrate bias voltage effects</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.jmapro.2024.06.037&Exemplar=1&LAN=DE A1 Ren, Beibei A1 Su, Yifan A1 Lou, Jia A1 Zhang, Cheng A1 Tang, Peng A1 Lin, Songsheng A1 Dai, Mingjiang A1 Zhou, Kesong PB Elsevier BV YR 2024 SN 1526-6125 JF Journal of Manufacturing Processes VO 124 SP 385 OP 398 LK http://dx.doi.org/https://doi.org/10.1016/j.jmapro.2024.06.037 DO https://doi.org/10.1016/j.jmapro.2024.06.037 SF ELIB - SuUB Bremen
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