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Thin-film formation of Si clathrates on Si wafers:
Ohashi, Fumitaka
;
Iwai, Yoshiki
;
Noguchi, Akihiro
...
Journal of Physics and Chemistry of Solids. 75 (2014) 4 - p. 518-522 , 2014
Link:
https://doi.org/10.1016/j.jpcs.2013.12.009
RT Journal T1 <Title>Thin-film formation of Si clathrates on Si wafers</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.jpcs.2013.12.009&Exemplar=1&LAN=DE A1 Ohashi, Fumitaka A1 Iwai, Yoshiki A1 Noguchi, Akihiro A1 Sugiyama, Tomoya A1 Hattori, Masashi A1 Ogura, Takuya A1 Himeno, Roto A1 Kume, Tetsuji A1 Ban, Takayuki A1 Nonomura, Shuichi PB Elsevier BV YR 2014 SN 0022-3697 JF Journal of Physics and Chemistry of Solids VO 75 IS 4 SP 518 OP 522 LK http://dx.doi.org/https://doi.org/10.1016/j.jpcs.2013.12.009 DO https://doi.org/10.1016/j.jpcs.2013.12.009 SF ELIB - SuUB Bremen
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