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Impact of atomic layer deposition temperature on electrical..:
Masmitjà, Gerard
;
Estarlich, Pau
;
Lopez, Gema
...
Journal of Science: Advanced Materials and Devices. 9 (2024) 2 - p. 100698 , 2024
Link:
https://doi.org/10.1016/j.jsamd.2024.100698
RT Journal T1 <Title>Impact of atomic layer deposition temperature on electrical and optical properties of ZnO:Al films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.jsamd.2024.100698&Exemplar=1&LAN=DE A1 Masmitjà, Gerard A1 Estarlich, Pau A1 Lopez, Gema A1 Martín, Isidro A1 Voz, Cristobal A1 Placidi, Marcel A1 Torrens, Arnau A1 Saucedo Silva, Edgardo A1 Vasquez, Pia A1 Muñoz, Delfina A1 Puigdollers, Joaquim A1 Ortega, Pablo PB Elsevier BV YR 2024 SN 2468-2179 JF Journal of Science: Advanced Materials and Devices VO 9 IS 2 SP 100698 LK http://dx.doi.org/https://doi.org/10.1016/j.jsamd.2024.100698 DO https://doi.org/10.1016/j.jsamd.2024.100698 SF ELIB - SuUB Bremen
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