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Patterning capability of new molecular resist in EUV lithog..:
Oizumi, Hiroaki
;
Tanaka, Yuusuke
;
Kumise, Takaaki
...
Microelectronic Engineering. 84 (2007) 5-8 - p. 1049-1053 , 2007
Link:
https://doi.org/10.1016/j.mee.2007.01.052
RT Journal T1
Patterning capability of new molecular resist in EUV lithography
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mee.2007.01.052&Exemplar=1&LAN=DE A1 Oizumi, Hiroaki A1 Tanaka, Yuusuke A1 Kumise, Takaaki A1 Shiono, Daiju A1 Hirayama, Taku A1 Hada, Hideo A1 Onodera, Junichi A1 Yamaguchi, Atsuko A1 Nishiyama, Iwao PB Elsevier BV YR 2007 SN 0167-9317 JF Microelectronic Engineering VO 84 IS 5-8 SP 1049 OP 1053 LK http://dx.doi.org/https://doi.org/10.1016/j.mee.2007.01.052 DO https://doi.org/10.1016/j.mee.2007.01.052 SF ELIB - SuUB Bremen
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