I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
LER evaluation of molecular resist for EUV lithography:
Shiono, Daiju
;
Hada, Hideo
;
Yukawa, Hiroto
...
Microelectronic Engineering. 84 (2007) 5-8 - p. 1084-1087 , 2007
Link:
https://doi.org/10.1016/j.mee.2007.01.146
RT Journal T1
LER evaluation of molecular resist for EUV lithography
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mee.2007.01.146&Exemplar=1&LAN=DE A1 Shiono, Daiju A1 Hada, Hideo A1 Yukawa, Hiroto A1 Oizumi, Hiroaki A1 Nishiyama, Iwao A1 Kojima, Kyoko A1 Fukuda, Hiroshi PB Elsevier BV YR 2007 SN 0167-9317 JF Microelectronic Engineering VO 84 IS 5-8 SP 1084 OP 1087 LK http://dx.doi.org/https://doi.org/10.1016/j.mee.2007.01.146 DO https://doi.org/10.1016/j.mee.2007.01.146 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)