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SrHfO3 as gate dielectric for future CMOS technology:

Rossel, C. ; Sousa, M. ; Marchiori, C....
Microelectronic Engineering.  84 (2007)  9-10 - p. 1869-1873 , 2007
Link: https://doi.org/10.1016/j.mee.2007.04.029