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1 Ergebnisse
1
Etching characteristics of photoresist and low-k dielectric..:
Kim, Hyoun Woo
;
Lee, Jong Woo
;
Hwang, Woon Suk
...
Microelectronic Engineering. 85 (2008) 2 - p. 300-303 , 2008
Link:
https://doi.org/10.1016/j.mee.2007.06.016
RT Journal T1
Etching characteristics of photoresist and low-k dielectrics by Ar/O2 ferrite-core inductively coupled plasmas
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mee.2007.06.016&Exemplar=1&LAN=DE A1 Kim, Hyoun Woo A1 Lee, Jong Woo A1 Hwang, Woon Suk A1 O, Beom Hoan A1 Lee, Seung Gol A1 Park, Se-Geun A1 Kim, Joohee A1 Chung, Duck Jin A1 Chang, Sung Pil A1 Joo, Young-Chang A1 Joo, Junghoon A1 Chung, Chin Wook A1 Park, Wan Jae A1 Kang, Chang-Jin A1 Joo, Sukho A1 Park, Soon Oh A1 Yoo, Chung-Gon A1 Kim, Sung Kyeong A1 Lee, Joung Ho A1 Cho, Sang-Deog A1 Choi, Dae-Kyu A1 Kim, Keeho A1 Jang, Jeong-Yeol PB Elsevier BV YR 2008 SN 0167-9317 JF Microelectronic Engineering VO 85 IS 2 SP 300 OP 303 LK http://dx.doi.org/https://doi.org/10.1016/j.mee.2007.06.016 DO https://doi.org/10.1016/j.mee.2007.06.016 SF ELIB - SuUB Bremen
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