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1 Ergebnisse
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Analysis of irregular increase in sheet resistance of Ni si..:
Tsutsui, Kazuo
;
Xiang, Ruifei
;
Nagahiro, Koji
...
Microelectronic Engineering. 85 (2008) 2 - p. 315-319 , 2008
Link:
https://doi.org/10.1016/j.mee.2007.07.002
RT Journal T1
Analysis of irregular increase in sheet resistance of Ni silicides on transition from NiSi to NiSi2
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mee.2007.07.002&Exemplar=1&LAN=DE A1 Tsutsui, Kazuo A1 Xiang, Ruifei A1 Nagahiro, Koji A1 Shiozawa, Takashi A1 Ahmet, Parhat A1 Okuno, Yasutoshi A1 Matsumoto, Michikazu A1 Kubota, Masafumi A1 Kakushima, Kuniyuki A1 Iwai, Hiroshi PB Elsevier BV YR 2008 SN 0167-9317 JF Microelectronic Engineering VO 85 IS 2 SP 315 OP 319 LK http://dx.doi.org/https://doi.org/10.1016/j.mee.2007.07.002 DO https://doi.org/10.1016/j.mee.2007.07.002 SF ELIB - SuUB Bremen
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