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Simulation of TaNdeposition by Reactive PVD:
Wolf, H.
;
Streiter, R.
;
Friedemann, M.
...
Microelectronic Engineering. 87 (2010) 10 - p. 1907-1913 , 2010
Link:
https://doi.org/10.1016/j.mee.2009.11.044
RT Journal T1 <Title>Simulation of TaNdeposition by Reactive PVD</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mee.2009.11.044&Exemplar=1&LAN=DE A1 Wolf, H. A1 Streiter, R. A1 Friedemann, M. A1 Belsky, P. A1 Bakaeva, O. A1 Letz, T. A1 Gessner, T. PB Elsevier BV YR 2010 SN 0167-9317 JF Microelectronic Engineering VO 87 IS 10 SP 1907 OP 1913 LK http://dx.doi.org/https://doi.org/10.1016/j.mee.2009.11.044 DO https://doi.org/10.1016/j.mee.2009.11.044 SF ELIB - SuUB Bremen
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