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Electroforming of Ni mold for imprint lithography using hig..:
Tanabe, Yusuke
;
Nishikawa, Hiroyuki
;
Seki, Yoshihiro
...
Microelectronic Engineering. 88 (2011) 8 - p. 2145-2148 , 2011
Link:
https://doi.org/10.1016/j.mee.2011.01.019
RT Journal T1 <Title>Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mee.2011.01.019&Exemplar=1&LAN=DE A1 Tanabe, Yusuke A1 Nishikawa, Hiroyuki A1 Seki, Yoshihiro A1 Satoh, Takahiro A1 Ishii, Yasuyuki A1 Kamiya, Tomihiro A1 Watanabe, Tohru A1 Sekiguchi, Atsushi PB Elsevier BV YR 2011 SN 0167-9317 JF Microelectronic Engineering VO 88 IS 8 SP 2145 OP 2148 LK http://dx.doi.org/https://doi.org/10.1016/j.mee.2011.01.019 DO https://doi.org/10.1016/j.mee.2011.01.019 SF ELIB - SuUB Bremen
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