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Characterization of half-pitch 15-nm metal wire circuit fab..:
Kasahara, Yusuke
;
Seino, Yuriko
;
Sato, Hironobu
...
Microelectronic Engineering. 159 (2016) - p. 21-26 , 2016
Link:
https://doi.org/10.1016/j.mee.2016.02.002
RT Journal T1
Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mee.2016.02.002&Exemplar=1&LAN=DE A1 Kasahara, Yusuke A1 Seino, Yuriko A1 Sato, Hironobu A1 Kanai, Hideki A1 Kobayashi, Katsutoshi A1 Kubota, Hitoshi A1 Miyagi, Ken A1 Minegishi, Shinya A1 Kodera, Katsuyoshi A1 Kihara, Naoko A1 Nomura, Satoshi A1 Tobana, Toshikatsu A1 Shiraishi, Masayuki A1 Kawamonzen, Yoshiaki A1 Azuma, Tsukasa PB Elsevier BV YR 2016 SN 0167-9317 JF Microelectronic Engineering VO 159 SP 21 OP 26 LK http://dx.doi.org/https://doi.org/10.1016/j.mee.2016.02.002 DO https://doi.org/10.1016/j.mee.2016.02.002 SF ELIB - SuUB Bremen
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