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1 Ergebnisse
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Controlled cobalt recess for advanced interconnect metalliz..:
Pacco, Antoine
;
Akanishi, Yuya
;
Le, Quoc Toan
...
Microelectronic Engineering. 217 (2019) - p. 111131 , 2019
Link:
https://doi.org/10.1016/j.mee.2019.111131
RT Journal T1
Controlled cobalt recess for advanced interconnect metallization
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mee.2019.111131&Exemplar=1&LAN=DE A1 Pacco, Antoine A1 Akanishi, Yuya A1 Le, Quoc Toan A1 Kesters, Els A1 Murdoch, Gayle A1 Holsteyns, Frank PB Elsevier BV YR 2019 SN 0167-9317 JF Microelectronic Engineering VO 217 SP 111131 LK http://dx.doi.org/https://doi.org/10.1016/j.mee.2019.111131 DO https://doi.org/10.1016/j.mee.2019.111131 SF ELIB - SuUB Bremen
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