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Investigation of particle agglomeration with in-situ genera..:
Jeong, Yeon-Ah
;
Poddar, Maneesh Kumar
;
Ryu, Heon-Yul
...
Microelectronic Engineering. 218 (2019) - p. 111133 , 2019
Link:
https://doi.org/10.1016/j.mee.2019.111133
RT Journal T1
Investigation of particle agglomeration with in-situ generation of oxygen bubble during the tungsten chemical mechanical polishing (CMP) process
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mee.2019.111133&Exemplar=1&LAN=DE A1 Jeong, Yeon-Ah A1 Poddar, Maneesh Kumar A1 Ryu, Heon-Yul A1 Yerriboina, Nagendra Prasad A1 Kim, Tae-Gon A1 Kim, Jaehyun A1 Park, Jong-Dai A1 Lee, Mingun A1 Park, Chang-Yong A1 Han, Seongjun A1 Kim, Myeong-Jun A1 Park, Jin-Goo PB Elsevier BV YR 2019 SN 0167-9317 JF Microelectronic Engineering VO 218 SP 111133 LK http://dx.doi.org/https://doi.org/10.1016/j.mee.2019.111133 DO https://doi.org/10.1016/j.mee.2019.111133 SF ELIB - SuUB Bremen
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