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A systematic dry etching process for profile control of qua..:
Sutikno, Madnarski
;
Hashim, Uda
;
Azhar Zahid Jamal, Zul
Microelectronics Journal. 38 (2007) 8-9 - p. 823-827 , 2007
Link:
https://doi.org/10.1016/j.mejo.2007.07.081
RT Journal T1
A systematic dry etching process for profile control of quantum dots and nanoconstrictions
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mejo.2007.07.081&Exemplar=1&LAN=DE A1 Sutikno, Madnarski A1 Hashim, Uda A1 Azhar Zahid Jamal, Zul PB Elsevier BV YR 2007 SN 0026-2692 JF Microelectronics Journal VO 38 IS 8-9 SP 823 OP 827 LK http://dx.doi.org/https://doi.org/10.1016/j.mejo.2007.07.081 DO https://doi.org/10.1016/j.mejo.2007.07.081 SF ELIB - SuUB Bremen
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