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Improvement of low-frequency noise behavior with chloridic ..:
Hessler, Daniel
;
Olivo, Ricardo
;
Baldauf, Tim
...
Memories - Materials, Devices, Circuits and Systems. 7 (2024) - p. 100095 , 2024
Link:
https://doi.org/10.1016/j.memori.2023.100095
RT Journal T1 <Title>Improvement of low-frequency noise behavior with chloridic precursor materials at ALD process</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.memori.2023.100095&Exemplar=1&LAN=DE A1 Hessler, Daniel A1 Olivo, Ricardo A1 Baldauf, Tim A1 Seidel, Konrad A1 Hoffmann, Raik A1 Woo, Chaiwon A1 Lederer, Maximilian A1 Raffel, Yannick PB Elsevier BV YR 2024 SN 2773-0646 JF Memories - Materials, Devices, Circuits and Systems VO 7 SP 100095 LK http://dx.doi.org/https://doi.org/10.1016/j.memori.2023.100095 DO https://doi.org/10.1016/j.memori.2023.100095 SF ELIB - SuUB Bremen
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