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Impact of heavy ions on a-Si:H/PolySi bilayer thin film tra..:
Sharma, Deepak K.
;
Kumar, Vivek
Memories - Materials, Devices, Circuits and Systems. 7 (2024) - p. 100096 , 2024
Link:
https://doi.org/10.1016/j.memori.2023.100096
RT Journal T1 <Title>Impact of heavy ions on a-Si:H/PolySi bilayer thin film transistors with Schottky barrier source and drain based on Nickel Silicide</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.memori.2023.100096&Exemplar=1&LAN=DE A1 Sharma, Deepak K. A1 Kumar, Vivek PB Elsevier BV YR 2024 SN 2773-0646 JF Memories - Materials, Devices, Circuits and Systems VO 7 SP 100096 LK http://dx.doi.org/https://doi.org/10.1016/j.memori.2023.100096 DO https://doi.org/10.1016/j.memori.2023.100096 SF ELIB - SuUB Bremen
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