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1 Ergebnisse
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Optimized plasma-assisted bi-layer photoresist fabrication ..:
Schuller, Patrick
;
Rothbauer, Mario
;
Eilenberger, Christoph
...
MethodsX. 6 (2019) - p. 2606-2613 , 2019
Link:
https://doi.org/10.1016/j.mex.2019.10.038
RT Journal T1
Optimized plasma-assisted bi-layer photoresist fabrication protocol for high resolution microfabrication of thin-film metal electrodes on porous polymer membranes
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mex.2019.10.038&Exemplar=1&LAN=DE A1 Schuller, Patrick A1 Rothbauer, Mario A1 Eilenberger, Christoph A1 Kratz, Sebastian R.A. A1 Höll, Gregor A1 Taus, Philipp A1 Schinnerl, Markus A1 Genser, Jakob A1 Ertl, Peter A1 Wanzenboeck, Heinz PB Elsevier BV YR 2019 SN 2215-0161 JF MethodsX VO 6 SP 2606 OP 2613 LK http://dx.doi.org/https://doi.org/10.1016/j.mex.2019.10.038 DO https://doi.org/10.1016/j.mex.2019.10.038 SF ELIB - SuUB Bremen
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