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A comparative analysis of GaN and InGaN/GaN coupling channe..:
Murugapandiyan, P.
;
Kalva, Sri Rama Krishna
;
Rajyalakshmi, V.
...
Micro and Nanostructures. 177 (2023) - p. 207545 , 2023
Link:
https://doi.org/10.1016/j.micrna.2023.207545
RT Journal T1
A comparative analysis of GaN and InGaN/GaN coupling channel HEMTs on silicon carbide substrate for high linear RF applications
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.micrna.2023.207545&Exemplar=1&LAN=DE A1 Murugapandiyan, P. A1 Kalva, Sri Rama Krishna A1 Rajyalakshmi, V. A1 Princy, B. Anni A1 Tarauni, Yusuf U. A1 Fletcher, Augustine A1 Wasim, Mohd PB Elsevier BV YR 2023 SN 2773-0123 JF Micro and Nanostructures VO 177 SP 207545 LK http://dx.doi.org/https://doi.org/10.1016/j.micrna.2023.207545 DO https://doi.org/10.1016/j.micrna.2023.207545 SF ELIB - SuUB Bremen
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