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1 Ergebnisse
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The role of process and geometrical parameters of gate stac..:
Munjal, Sameeksha
;
Rup Prakash, Neelam
;
Kaur, Jasbir
.
Micro and Nanostructures. 193 (2024) - p. 207924 , 2024
Link:
https://doi.org/10.1016/j.micrna.2024.207924
RT Journal T1
The role of process and geometrical parameters of gate stack Inverted-T shape junction less FET at 20 nm technology node
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.micrna.2024.207924&Exemplar=1&LAN=DE A1 Munjal, Sameeksha A1 Rup Prakash, Neelam A1 Kaur, Jasbir A1 Komal PB Elsevier BV YR 2024 SN 2773-0123 JF Micro and Nanostructures VO 193 SP 207924 LK http://dx.doi.org/https://doi.org/10.1016/j.micrna.2024.207924 DO https://doi.org/10.1016/j.micrna.2024.207924 SF ELIB - SuUB Bremen
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