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Improvement of TDDB reliability, characteristics of HfO2 hi..:
Hsu, Chia-Wei
;
Fang, Yean-Kuen
;
Yeh, Wen-Kuan
...
Microelectronics Reliability. 50 (2010) 5 - p. 618-621 , 2010
Link:
https://doi.org/10.1016/j.microrel.2010.01.045
RT Journal T1
Improvement of TDDB reliability, characteristics of HfO2 high-k/metal gate MOSFET device with oxygen post deposition annealing
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.microrel.2010.01.045&Exemplar=1&LAN=DE A1 Hsu, Chia-Wei A1 Fang, Yean-Kuen A1 Yeh, Wen-Kuan A1 Chen, Chun-Yu A1 Chiang, Yen-Ting A1 Juang, Feng-Renn A1 Lin, Chien-Ting A1 Lai, Chien-Ming PB Elsevier BV YR 2010 SN 0026-2714 JF Microelectronics Reliability VO 50 IS 5 SP 618 OP 621 LK http://dx.doi.org/https://doi.org/10.1016/j.microrel.2010.01.045 DO https://doi.org/10.1016/j.microrel.2010.01.045 SF ELIB - SuUB Bremen
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