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Extensive assessment of the charge-trapping kinetics in InG..:
Putcha, Vamsi
;
Franco, Jacopo
;
Vais, Abhitosh
...
Microelectronics Reliability. 115 (2020) - p. 113996 , 2020
Link:
https://doi.org/10.1016/j.microrel.2020.113996
RT Journal T1
Extensive assessment of the charge-trapping kinetics in InGaAs MOS gate-stacks for the demonstration of improved BTI reliability
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.microrel.2020.113996&Exemplar=1&LAN=DE A1 Putcha, Vamsi A1 Franco, Jacopo A1 Vais, Abhitosh A1 Kaczer, Ben A1 Xie, Qi A1 Maes, Jan Willem A1 Tang, Fu A1 Givens, Michael A1 Collaert, Nadine A1 Linten, Dimitri A1 Groeseneken, Guido PB Elsevier BV YR 2020 SN 0026-2714 JF Microelectronics Reliability VO 115 SP 113996 LK http://dx.doi.org/https://doi.org/10.1016/j.microrel.2020.113996 DO https://doi.org/10.1016/j.microrel.2020.113996 SF ELIB - SuUB Bremen
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