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Influence of pinning trap in Ti/4H–SiC Schottky barrier dio..:

Ohtsuka, K. ; Matsuno, Y. ; Hase, Y....
Materials Science in Semiconductor Processing.  6 (2003)  5-6 - p. 359-362 , 2003
Link: https://doi.org/10.1016/j.mssp.2003.08.016