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1 Ergebnisse
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Effects of post-oxidation annealing temperature on ZrO2 thi..:
Kurniawan, Tedi
;
Wong, Yew Hoong
;
Yew Cheong, Kuan
...
Materials Science in Semiconductor Processing. 14 (2011) 1 - p. 13-17 , 2011
Link:
https://doi.org/10.1016/j.mssp.2010.12.011
RT Journal T1
Effects of post-oxidation annealing temperature on ZrO2 thin film deposited on 4H-SiC substrate
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2010.12.011&Exemplar=1&LAN=DE A1 Kurniawan, Tedi A1 Wong, Yew Hoong A1 Yew Cheong, Kuan A1 Moon, Jeong Hyun A1 Bahng, Wook A1 Abdul Razak, Khairunisak A1 Lockman, Zainovia A1 Joon Kim, Hyeong A1 Kim, Nam-Kyun PB Elsevier BV YR 2011 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 14 IS 1 SP 13 OP 17 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2010.12.011 DO https://doi.org/10.1016/j.mssp.2010.12.011 SF ELIB - SuUB Bremen
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