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1 Ergebnisse
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Study of the mechanism of multi-channel discharge in semico..:
Chen, Hao-ran
;
Liu, Zhi-dong
;
Huang, Sai-juan
..
Materials Science in Semiconductor Processing. 32 (2015) - p. 125-130 , 2015
Link:
https://doi.org/10.1016/j.mssp.2014.12.061
RT Journal T1 <Title>Study of the mechanism of multi-channel discharge in semiconductor processing by WEDM</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2014.12.061&Exemplar=1&LAN=DE A1 Chen, Hao-ran A1 Liu, Zhi-dong A1 Huang, Sai-juan A1 Pan, Hui-jun A1 Qiu, Ming-bo PB Elsevier BV YR 2015 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 32 SP 125 OP 130 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2014.12.061 DO https://doi.org/10.1016/j.mssp.2014.12.061 SF ELIB - SuUB Bremen
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