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Advantages of a slim vertical gas channel at high SiHCl3 co..:

Irikura, Kenta ; Muroi, Mitsuko ; Yamada, Ayami...
Materials Science in Semiconductor Processing.  87 (2018)  - p. 13-18 , 2018
Link: https://doi.org/10.1016/j.mssp.2018.07.006