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1 Ergebnisse
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Effect of RF sputtering power and vacuum annealing on the p..:
Challali, Fatiha
;
Mendil, Djelloul
;
Touam, Tahar
...
Materials Science in Semiconductor Processing. 118 (2020) - p. 105217 , 2020
Link:
https://doi.org/10.1016/j.mssp.2020.105217
RT Journal T1 <Title>Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2020.105217&Exemplar=1&LAN=DE A1 Challali, Fatiha A1 Mendil, Djelloul A1 Touam, Tahar A1 Chauveau, Thierry A1 Bockelée, Valérie A1 Sanchez, Alexis Garcia A1 Chelouche, Azeddine A1 Besland, Marie-Paule PB Elsevier BV YR 2020 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 118 SP 105217 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2020.105217 DO https://doi.org/10.1016/j.mssp.2020.105217 SF ELIB - SuUB Bremen
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