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1 Ergebnisse
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Thickness dependencies of SiO2/BaOx layers on interfacial p..:
Muraoka, Kosuke
;
Ishikawa, Seiji
;
Sezaki, Hiroshi
...
Materials Science in Semiconductor Processing. 121 (2021) - p. 105343 , 2021
Link:
https://doi.org/10.1016/j.mssp.2020.105343
RT Journal T1 <Title>Thickness dependencies of SiO2/BaOx layers on interfacial properties of a layered gate dielectric on 4H-SiC</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2020.105343&Exemplar=1&LAN=DE A1 Muraoka, Kosuke A1 Ishikawa, Seiji A1 Sezaki, Hiroshi A1 Tomonori, Maeda A1 Yasuno, Satoshi A1 Koganezawa, Tomoyuki A1 Kuroki, Shin-Ichiro PB Elsevier BV YR 2021 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 121 SP 105343 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2020.105343 DO https://doi.org/10.1016/j.mssp.2020.105343 SF ELIB - SuUB Bremen
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