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Complete degradation of tamoxifen using FeNi3@SiO2@ZnO as a..:
Arghavan, Fatemeh Sadat
;
Al-Musawi, Tariq J.
;
Allahyari, Elaheh
...
Materials Science in Semiconductor Processing. 128 (2021) - p. 105725 , 2021
Link:
https://doi.org/10.1016/j.mssp.2021.105725
RT Journal T1
Complete degradation of tamoxifen using FeNi3@SiO2@ZnO as a photocatalyst with UV light irradiation: A study on the degradation process and sensitivity analysis using ANN tool
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2021.105725&Exemplar=1&LAN=DE A1 Arghavan, Fatemeh Sadat A1 Al-Musawi, Tariq J. A1 Allahyari, Elaheh A1 Moslehi, Mohammad Hadi A1 Nasseh, Negin A1 Hossein Panahi, Ayat PB Elsevier BV YR 2021 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 128 SP 105725 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2021.105725 DO https://doi.org/10.1016/j.mssp.2021.105725 SF ELIB - SuUB Bremen
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